Gaining a better understanding of plasma formation for extreme ultraviolet light
A study into the acceleration and deformation of microscopically small tin drops by an intense laser pulse resulted in the first scientific publication from the Advanced Research Center for Nanolithography (ARNCL), in collaboration with the University of Twente and chip equipment manfucturer ASML. Such tin drops are used in the latest devices of ASML to generate extreme ultra-violet (EUV) light. The researchers publish their findings on 29 July 2016 in the journal Physical Review Applied.
On an apparently normal cube a pattern of hollows and bulges appears when the cube is compressed. Physicists from FOM Institute AMOLF and Leiden University together with colleagues from Tel Aviv University have developed a method to design such three-dimensional structures and to construct these using simple building blocks. This paves the way for the use of 'machine materials' in, for example, prostheses and wearable technology. The researchers will publish their findings on 28 July in an article in Nature.
In its strategic plan, FOM has incorporated greater involvement of Small and Medium Enterprises (SMEs) in fundamental research. Within NWO there are KIEM tools for this, such as KIEM for the Top Sector Chemical Top Sector. FOM is now launching a tool that focuses on partnerships with SMEs in the Top Sector High Tech Systems and Materials (HTSM): KIEM-HTSM. Innovative collaboration projects from businesses and research institutes, in which the business community wishes to invest, can submit project proposals to FOM.