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URL of this page :
https://www.fom.nl/en/vacature/group-leader-assistant-professor-extreme-ultraviolet-photoelectron-spectroscopy-and-microscopy/

Printed on :
March 30th 2017
16:38:34

Research
The Advanced Research Center for Nanolithography (ARCNL) and AMOLF (both located in Amsterdam, the Netherlands) are looking for a tenure-track group leader in the field of extreme ultraviolet photoelectron spectroscopy and microscopy. The successful candidate will use photoelectron spectroscopy and/or photoelectron microscopy techniques to study the electronic properties of (nanostructured) material and/or molecular systems in the context of advanced EUV lithography. In this research use will be made of the extreme ultraviolet light sources available at ARCNL and/or at synchrotron facilities. Candidates with strong physics, chemistry and/or materials backgrounds in one or more of the following areas are especially encouraged to apply:
• Photoelectron spectroscopic characterization of metals, semiconductors, soft materials and/or liquids;
• Time-resolved photoelectron spectroscopy;
• Low-energy electron microscopy (LEEM) and/or photoelectron emission microscopy (PEEM) of surfaces and/or thin films.
The group of the successful candidate will work together with other research groups located at ARCNL and AMOLF, and can make use of the facilities of AMOLF and ARCNL including (femtosecond and nanosecond) EUV sources, ultrafast spectroscopy techniques, and the Amsterdam nanoCenter.
The group will be housed within ARCNL and AMOLF. The group leader position is equivalent to that of a tenure-track assistant professor. The group will have a state-of-the art UHV set-up for photoelectron spectroscopy including differential pumping and a liquid-jet facility. Group leaders will be granted a competitive start-up package for equipment and PhD students. Technical support will be provided by dedicated group technicians and by the technical support departments (electronic, software and mechanical) of AMOLF.

Job description
The group leader:
• initiates a novel research programme in EUV photoelectron spectroscopy and/or microscopy;
• develops and combines novel experimental techniques;
• acquires national and international financial support to expand his/her group;
• directs the group members and the implementation of the projects within the group;
• is responsible for the budget, the planning, and the quality of the projects within the group;
• collaborates actively with the other research groups at ARCNL and AMOLF, in particular those working on surfaces, thin films and photoresist materials;
• establishes and maintains active collaboration with ASML research;
• contributes actively to the positioning of the field both nationally and internationally;
• realizes publications in leading international journals;
• gives talks and lectures within and outside the Netherlands;
• develops and maintains national and international relations.

Location
The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Netherlands Organisation for Scientific Research (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU) and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, the Netherlands, and is currently building up towards a size of approximately 100 scientists and support staff. See also www.arcnl.nl.
AMOLF is one of the research laboratories of the Netherlands Organisation for Scientific Research (NWO). AMOLF employs about 140 fte research staff and 70 fte support staff and is also located in Amsterdam Science Park. AMOLF studies the fundamental physics and design principles of natural and man-made complex and functional matter, with focus on nanophotonics, photovoltaics, designer matter and living matter. See also www.amolf.nl.

Requirements
• Trained and graduated in a relevant field of research.
• Postdoctoral research experience in photoelectron spectroscopy and/or microscopy.

Conditions of employment
The position is for the duration of five and a half years in the service of the NWO Institutes Organisation (NWO-I). After four years, the performance will be evaluated, and if this evaluation is positive, a permanent position with NWO-I will be offered. At the same time a combined professorship at one of the Dutch universities may also be arranged. ARCNL and AMOLF assist new foreign employees with housing and visa applications and compensate their transport costs.
Your salary will be up to a maximum of 5.425 euro gross per month, depending on your level of experience. The conditions of employment of NWO-I are laid down in the Collective Labour Agreement for Research Centres (Cao-Onderzoekinstellingen), more exclusive information is available at this website under Personeelsinformatie (in Dutch) or under Personnel (in English). General information about working at NWO-I can be found in the English part of this website under Personnel. The 'Job interview code' applies to this position.

Contact
Prof.dr. J.W.M. Frenken, Director ARCNL, +31 20 851 71 00.

Application
To apply, please, submit an application letter, a research proposal (maximum six pages), resume, list of publications and names of three references. The final application date is 31 March 2017.
Online screening may be part of the selection.
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